INO Annual Symposium 2018 | Main

Keynote Speakers

Distinguished Keynote Speakers will present plenary lectures linked to key areas of topical interest within INO,
with special attention to the focus on Extreme Light-Matter Interactions, the 2018 Symposium edition focus theme.


John COLLIER
STFC Rutherford Appleton Laboratory, Central Laser Facility,Didcot, England
"Putting Extreme Light to Work"


Gérard MOUROU
École Polytechnique,IZEST, International Center for Zetta-Exawatt Science and Technology, Palaiseau, France
"From Chirped-Pulse Amplification to ELI and Beyond"


Wim UBACHS
Vrije University of Amsterdam, Advanced Research Center for Nanolithography, Netherlands
"Laser-produced tin plasma source for extreme ultraviolet nanolithography"


Keynote, Oral and Poster sessions will be dedicated to the
most exciting INO research, with
highlights of recently published results.